Chapter 2

A Brief Overview of Lithographic Advancements in the Last Decade with a Focus on Double Patterning

Jongwook Kye and Rasit O. Topaloglu

Abstract

To cope with the printability of smaller transistor and interconnect features in semiconductor integrated circuit manufacturing, the area of lithography has seen significant advancements over the last decade. In this chapter, we briefly go over these advancements while giving more weight on recent advancements and methods or those that have prevailed over the time. As particular examples for the recent developments, we review the area of double patterning lithography.

Total Pages: 3-20 (18)

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