Chapter 4

Ion Implantation Profile in Multi-Layer Structure

Kunihiro Suzuki

Abstract

It is important to predict ion implanted profiles in substrates comprised of different materials, where related moment parameters are different. We describe two procedures to generate profiles in multi-layers by using data for each layer, that is, dose matching method, and R<sub>p</sub> normalized method, where R<sub>p</sub> is the projected range. We show the process in which the methods are applied to multi-layers. Dose matching method is a simple and effective method. However, it provides unstable results sometimes, while R<sub>p</sub> normalized method provides stable results.

Total Pages: 54-68 (15)

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