Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications

by

Filipe Vaz, Nicolas Martin, Martin Fenker

DOI: 10.2174/97816080515641130101
eISBN: 978-1-60805-156-4, 2013
ISBN: 978-1-60805-157-1



Indexed in: EBSCO.

Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through opto...[view complete introduction]
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Oxynitrides and Oxides Deposited by Cathodic Vacuum Arc

- Pp. 265-284 (20)

Jörg Vetter

Abstract

Different methods of cathodic vacuum arc evaporation are used to deposit oxynitrides. Me<sub>a</sub>Me<sub>b</sub>Si<sub>c</sub>N<sub>x</sub>O<sub>y</sub>C<sub>z</sub> coating systems with a+b+c+x+y+z =100 at.%. The paper summarizes the results of these coatings. Me is at least one metal of the group Cr, Al, Ti, Nb. The influence of process parameters like bias, partial pressure and evaporator current at the coating properties are discussed for different coating types. The generated oxynitride coatings show mechanical properties, oxidation behaviour, thermal stability and tribological properties which are promising for various tribological applications. The most highlighted coating system CrNO is in industrial mass production for piston rings.

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