Ion Implantation and Activation

Volume 3

by

Kunihiro Suzuki

DOI: 10.2174/97816080579241130301
eISBN: 978-1-60805-792-4, 2013
ISBN: 978-1-60805-793-1
ISSN: 2589-2940 (Print)
ISSN: 2215-0005 (Online)



Indexed in: EBSCO.

Ion Implantation and Activation – Volume 3 presents the derivation process of related models in a comprehensive step ...[view complete introduction]
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Diffusion Under Thermal Equilibrium

- Pp. 3-34 (32)

Kunihiro Suzuki

Abstract

We derive a diffusion flux and diffusion equation step by step, starting with a rough sketch one to a practical one. The flux is described with the paring with point defects, and the dependence of diffusion coefficients on doping concentration is emerged. We can predict diffusion profiles by solving the equation.

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