Bipolar Transistor and MOSFET Device Models

by

Kunihiro Suzuki

DOI: 10.2174/97816810826151160101
eISBN: 978-1-68108-261-5, 2016
ISBN: 978-1-60805-713-9



Indexed in: EBSCO.

Continuous efforts to develop new semiconductor devices enable device manufacturers to make significant improvements in the informatio...[view complete introduction]
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The Bipolar Transistor Model in the Low Injection Region

- Pp. 173-281 (109)

Kunihiro Suzuki

Abstract

We show the bipolar transistor models in low injection region, where the injected minority carrier concentration is much smaller than doping concentration. We describe the emitter, base, and collector current models, and related circuit parameters. The transit times in emitter, base, and collector regions are also important for circuit performance, and corresponding models are described. We first treat models for uniformly doped device, and extend them to the ones for non-uniform doped devices. Polycrystalline Si (poly-Si) is used for diffusion source to form emitter region in bulk Si. This poly-Si also plays a role as an emitter, and the related models are described. Further, we analyze the optimum base doping profile to minimize base transit time. We also cover the models for base width modulation and base resistance related to the lateral current flow beneath emitter region. Finally, we describe small signal, and large signal circuit model.

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