Ion Implantation and Activation

Volume 3

by

Kunihiro Suzuki

DOI: 10.2174/97816080579241130301
eISBN: 978-1-60805-792-4, 2013
ISBN: 978-1-60805-793-1
ISSN: 2589-2940 (Print)
ISSN: 2215-0005 (Online)



Indexed in: EBSCO.

Ion Implantation and Activation – Volume 3 presents the derivation process of related models in a comprehensive step ...[view complete introduction]
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Paring Diffusion Equation

- Pp. 35-55 (21)

Kunihiro Suzuki

Abstract

In this section, we consider reaction between impurity, point defects, and charges in diffusion phenomenon and diffusion equations for both of impurity and point defects. There are many levels of sophistication of treatment of the interaction of impurity and point defects. We perform approximations step by step, and derive diffusion models in various supplication levels.

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